The patent abstract shows that a micro An LED, including: a first type semiconductor layer; a first type capping layer formed on the first type semiconductor layer; and a light emitting layer formed on the first type capping layer; wherein the first type semiconductor layer includes a mesa structure, a trench, and an ion implantation fence separated from the mesa structure; the ion implantation fence is formed around the trench, and the trench is formed around the mesa structure; wherein the resistance of the first ion implantation fence is higher than the resistance of the first mesa structure.
RELATED NEWS
- Finnish company beneq has received additional orders for MicroLED atomic layer d 2026-05-31
- Hon Hai joins hands with research team to successfully break through multi-wavel 2026-05-31
- Hongli Zhihui and Haoyang Co., Ltd. obtained the latest invention patents 2026-05-31
- Hot topics of the week: Nationstar expands production and raises funds, Zhaochi 2026-05-31
- Enter SID 2025 and see the diverse applications of MicroLED 2026-05-31
CATEGORIES
LATEST NEWS
CONTACT US
Contact: Mack
Phone: +8613352972563
E-mail: mack@archled.net
Add: Building A2, Mingjinhai Second Industrial Zone, Shiyan Street, Baoan, Shenzhen,Guangdong,China

ANNA